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Extreme Ultraviolet Lithography [精裝]

  • 作者:Banqiu Wu,Ajay Kumar 著
  • 出版社: McGraw-Hill Professional
  • 出版時間:2009-04-03
  • 版次:1
  • 商品編號: 19163980

    頁數:482

    裝幀:精裝


HK$1,213.60 (速遞費用須知)
購買額滿HK$158免運費
免郵費優惠僅限香港、澳门、
台灣及中國大陸

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Master Extreme Ultraviolet Lithography TechniquesProduce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32?nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership.?Design EUVL-ready photomasks, resist layers, and source-collector modules



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